Low-Temperature Synthesis of Oxide and Nitride Thin Films by Hollow Cathode Plasma Atomic Layer Deposition and Analysis of in-situ Plasma and ex-situ Thermal Annealing -- embargoed -- 2024-08

Digital Document
Metadata
Persons
Persons
Creator (cre): Mohammad, Adnan
Major Advisor (mja): Biyikli, Necmi
Associate Advisor (asa): Jain, Faquir C.
Associate Advisor (asa): Ayers, John E.
Title
Title
Title
Low-Temperature Synthesis of Oxide and Nitride Thin Films by Hollow Cathode Plasma Atomic Layer Deposition and Analysis of in-situ Plasma and ex-situ Thermal Annealing -- embargoed -- 2024-08
Supplied
yes
Origin Information
Origin Information
Event Place
Storrs, CT
Date Created
2023
Publisher
University of Connecticut (783)
Issuance
monographic
Parent Item
Parent Item
Dissertations
Resource Type
Resource Type
Text
Description
Description
This dissertation is embargoed through August 2024.
Language
Language
English
Genre
Genre
doctoral dissertations
Organizations
Organizations
Degree granting institution (dgg): University of Connecticut
Held By
Held By
Archives & Special Collections, University of Connecticut Library
Rights Statement
Rights Statement
IN COPYRIGHT
Use and Reproduction
Use and Reproduction
These Materials are provided for educational and research purposes only.
Note
Note
Note Type
local
Note
atomic layer deposition, vanadium oxide, aluminum nitride, plasma deposition, thin films, and low temperature deposition
Degree Name
Degree Name
Doctor of Philosophy
Degree Level
Degree Level
Ph.D.
Degree Discipline
Degree Discipline
Electrical Engineering
Local Identifier
Local Identifier
S_43851277

May contain sensitive language or subject matter
See CTDA's Statement on Sensitive Content. External link icon

0 views

Share